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    Inline TCO Coating Equipment (Reactive Plasma Deposition, RPD/PAR),and Magnetron Sputter,PVD

    PRODUCTS AND SERVICES > Inline Equipment Series > Inline TCO Coating Equipment (Reactive Plasma Deposition, RPD/PAR),and Magnetron Sputter,PVD

    Inline TCO Coating Equipment (Reactive Plasma Deposition, RPD/PAR),and Magnetron Sputter,PVD

    In-line physical coating equipment for Transparent Conductive Oxide (TCO) coating on wafer,glass plate or flexible substrate.


    Equipment Name:

    Inline TCO Coating Equipment (Reactive Plasma Deposition, RPD/PAR),and Magnetron Sputter,PVD


    Equipment Model:

    PAR5500A


    Equipment Application:

    In-line physical coating equipment for Transparent Conductive Oxide (TCO) coating on wafer,glass plate or flexible substrate.


    Coating Principle:

    1、Magnetron Sputter (PVD).

    2、Reactive Plasma Deposition (RPD).


    Features:

    1、Multiple cathode operation for seed layer and multiple refractive index tandem TCO.

    2、No bombardment on the substrate while keeping high mobility.


    Parameters: